Growth of lanthanide-doped YF3 thin films by pulsed liquid...

Surface and Coatings Technology 2013 / 09 Vol. 230

Growth of lanthanide-doped YF3 thin films by pulsed liquid injection MOCVD: Influence of deposition parameters on film microstructure

Payrer, E.L., Almeida, R.M., Jimenez, C., Szkutnik, P.-D., Deschanvres, J.-L.
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Volume:
230
Language:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2013.06.099
Date:
September, 2013
File:
PDF, 1.59 MB
english, 2013
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