Elastic properties of porous low-k dielectric nano-films

Journal of Applied Physics 2011 Vol. 110; Iss. 4

Elastic properties of porous low-k dielectric nano-films

Zhou, W., Bailey, S., Sooryakumar, R., King, S., Xu, G., Mays, E., Ege, C., Bielefeld, J.
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Volume:
110
Year:
2011
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3624583
File:
PDF, 798 KB
english, 2011
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