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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Photoresist adhesion effect of resist reflow process
Park, Joon-Min, Lee, Ji-Eun, Kim, Moon-Seok, Kim, Jung-Hun, Kim, Jai-Soon, Lee, Sung-Muk, Park, Jun-Tack, Bok, Chul-Kyu, Moon, Seung-Chan, Park, Seung-Wook, Hong, Joo-Yoo, Oh, Hye-Keun, Lin, QinghuangVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.712498
File:
PDF, 511 KB
english, 2007