SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Evaluation of process-based resolution enhancement techniques to extend 193-nm lithography
Satyanarayana, Sripadma, Cohan, Chris L., Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485156
File:
PDF, 1.37 MB
english, 2003