SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography
Cho, In Wook, Park, Joon-Min, Kim, Hyunsu, Hong, Joo-Yoo, Kim, Seong-Sue, Cho, Han-Ku, Oh, Hye-Keun, Henderson, Clifford L.Volume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814108
File:
PDF, 933 KB
english, 2009