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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Study of dynamical formation and shape of microlenses formed by the reflow method
Audran, S., Faure, B., Mortini, B., Aumont, C., Tiron, R., Zinck, C., Sanchez, Y., Fellous, C., Regolini, J., Reynard, J. P., Schlatter, G., Hadziioannou, G., Lin, QinghuangVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.656371
File:
PDF, 294 KB
english, 2006