Monte Carlo simulation of electron transmission through the scattering masks with angular limitation for projection electron lithography
Sun, X., Ding, Z. J., Pu, Q. R., Li, H. M., Wu, Z. Q., Gu, W. Q., Peng, K. W., Wu, G. J., Zhang, F. A., Kang, N. K.Volume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1505679
File:
PDF, 407 KB
english, 2002