Effects of Plasma Processing Parameters on the Surface...

Journal of Physical Chemistry B 1997 / 11 Vol. 101; Iss. 48

Effects of Plasma Processing Parameters on the Surface Reactivity of OH(X 2 Π) in Tetraethoxysilane/O 2 Plasmas during Deposition of SiO 2

Bogart, K. H. A., Cushing, J. P., Fisher, Ellen R.
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Volume:
101
Language:
english
Journal:
The Journal of Physical Chemistry B
DOI:
10.1021/jp971596o
Date:
November, 1997
File:
PDF, 239 KB
english, 1997
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