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Single-Step Formation of ZnO/ZnWO x Bilayer Structure via Interfacial Engineering for High Performance and Low Energy Consumption Resistive Memory with Controllable High Resistance States
Lin, Shih-Ming, Huang, Jian-Shiou, Chang, Wen-Chih, Hou, Te-Chien, Huang, Hsin-Wei, Huang, Chi-Hsin, Lin, Su-Jien, Chueh, Yu-LunVolume:
5
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/am4016928
Date:
August, 2013
File:
PDF, 1.99 MB
english, 2013