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Novel Doping Process for Ultra-Shallow Junction: Rapid Vapor-Phase Direct Doping (RVD)
Kiyota, Yukihiro, Onai, Takahiro, Nakamura, Tohru, Inada, Taroh, Kuranouchi, Atsushi, Hirano, YasuakiVolume:
259
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-259-493
Date:
January, 1992
File:
PDF, 876 KB
english, 1992