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Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing
Malloy, MattVolume:
10
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.3642641
Date:
July, 2011
File:
PDF, 3.79 MB
english, 2011