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Effects of plasma spatial profile on conversion efficiency of laser-produced plasma sources for EUV lithography
Hassanein, AhmedVolume:
8
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.3224901
Date:
October, 2009
File:
PDF, 619 KB
english, 2009