Applicability of a binary amplitude mask for creating...

Optical Engineering 2012 / 07 Vol. 51; Iss. 7

Applicability of a binary amplitude mask for creating correctors of higher-order ocular aberrations in a photoresistive layer

Karitans, Varis
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
51
Language:
english
Journal:
Optical Engineering
DOI:
10.1117/1.OE.51.7.078001
Date:
July, 2012
File:
PDF, 2.89 MB
english, 2012
Conversion to is in progress
Conversion to is failed