![](/img/cover-not-exists.png)
[IEEE 2009 18th IEEE International Symposium on the Applications of Ferroelectrics (ISAF) - Xian, China (2009.08.23-2009.08.27)] 2009 18th IEEE International Symposium on the Applications of Ferroelectrics - Recrystallization of the copper bottom electrode during complex oxide deposition onto kapton films
Suchaneck, G., Hubicka, Z., Levin, A.A., Gunther, S., Cada, M., Dejneka, A., Jastrabik, L., Meyer, D.C., Schultheiss, E., Gerlach, G.Year:
2009
Language:
english
DOI:
10.1109/ISAF.2009.5307558
File:
PDF, 227 KB
english, 2009