Etching submicrometer trenches by using the Bosch process and its application to the fabrication of antireflection structures
Chang, Chienliu, Wang, Yeong-Feng, Kanamori, Yoshiaki, Shih, Ji-Jheng, Kawai, Yusuke, Lee, Chih-Kung, Wu, Kuang-Chong, Esashi, MasayoshiVolume:
15
Language:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/0960-1317/15/3/020
Date:
March, 2005
File:
PDF, 903 KB
english, 2005