Sensitizing DNA to Secondary Electron Damage:  Resonant...

Journal of the American Chemical Society 2001 / 06 Vol. 123; Iss. 22

Sensitizing DNA to Secondary Electron Damage:  Resonant Formation of Oxidative Radicals from 5-Halouracils

Abdoul-Carime, H., Huels, M. A., Illenberger, E., Sanche, L.
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Volume:
123
Language:
english
Journal:
Journal of the American Chemical Society
DOI:
10.1021/ja003952d
Date:
June, 2001
File:
PDF, 44 KB
english, 2001
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