![](/img/cover-not-exists.png)
Arsenic implantation into polycrystalline silicon and diffusion to silicon substrate
Tsukamoto, Katsuhiro, Akasaka, Youichi, Horie, KazuoVolume:
48
Year:
1977
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.323933
File:
PDF, 794 KB
english, 1977