[IEEE ESSDERC 2008 - 38th European Solid-State Device Research Conference - Edinburgh, UK (2008.09.15-2008.09.19)] ESSDERC 2008 - 38th European Solid-State Device Research Conference - Dual metal gate FinFET integration by Ta/Mo diffusion technology for Vt reduction and multi-Vt CMOS application
Matsukawa, Takashi, Endo, Kazuhiko, Liu, Yongxun, O'uchi, Shin-ichi, Masahara, Meishoku, Ishikawa, Yuki, Yamauchi, Hiromi, Tsukada, Junichi, Ishii, Ken-ichi, Sakamoto, Kunihiro, Suzuki, EiichiYear:
2008
Language:
english
DOI:
10.1109/ESSDERC.2008.4681753
File:
PDF, 1.73 MB
english, 2008