Dopant Control by Atomic Layer Deposition in Oxide Films...

Chemistry of Materials 2011 / 01 Vol. 23; Iss. 2

Dopant Control by Atomic Layer Deposition in Oxide Films for Memristive Switches

Yang, J. Joshua, Kobayashi, Nobuhiko P., Strachan, John Paul, Zhang, M.-X., Ohlberg, Douglas A. A., Pickett, Matthew D., Li, Zhiyong, Medeiros-Ribeiro, Gilberto, Williams, R. Stanley
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Volume:
23
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm1020959
Date:
January, 2011
File:
PDF, 698 KB
english, 2011
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