Annealing behavior of krypton-implanted aluminum: II. SEM...

Annealing behavior of krypton-implanted aluminum: II. SEM study on surface structure during emission of krypton atoms

I. Hashimoto, H. Yorikawa, H. Mitsuya, H. Yamaguchi, K. Furuya, E. Yagi, M. Iwaki
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Volume:
150
Year:
1987
Language:
english
Pages:
5
DOI:
10.1016/0022-3115(87)90098-5
File:
PDF, 735 KB
english, 1987
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