Realization of Thin Film Encapsulation by Atomic Layer Deposition of Al 2 O 3 at Low Temperature
Yang, Yong-Qiang, Duan, Yu, Chen, Ping, Sun, Feng-Bo, Duan, Ya-Hui, Wang, Xiao, Yang, DanVolume:
117
Language:
english
Journal:
The Journal of Physical Chemistry C
DOI:
10.1021/jp406738h
Date:
October, 2013
File:
PDF, 3.86 MB
english, 2013