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Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition
Tsu, D. V., Lucovsky, G., Mantini, M. J.Volume:
33
Language:
english
Journal:
Physical Review B
DOI:
10.1103/PhysRevB.33.7069
Date:
May, 1986
File:
PDF, 695 KB
english, 1986