Erratum to “Film deposition on metallic surfaces at liquid nitrogen temperature in view of the conditioning of FTU vacuum chamber” [Journal of nuclear materials 196–198 (1992) 549]
M.L. Apicella, A. Neri, L. VerdiniVolume:
202
Year:
1993
DOI:
10.1016/0022-3115(93)90044-y
File:
PDF, 24 KB
1993