The etch mechanisms of magnetic materials in an HCl plasma

Journal of Nuclear Materials 1993 Vol. 200; Iss. 3

The etch mechanisms of magnetic materials in an HCl plasma

F.C.M.J.M. van Delft, J.B. Giesbers
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Volume:
200
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/0022-3115(93)90310-u
File:
PDF, 529 KB
english, 1993
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