Plasma nitridation of thin SiO2 films: AES, ELS and IR...

Plasma nitridation of thin SiO2 films: AES, ELS and IR study

E.D. Atanassova, L.I. Popova
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Volume:
200
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/0022-3115(93)90320-x
File:
PDF, 405 KB
english, 1993
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