Fast deposition of amorphous carbon and silicon layers

Journal of Nuclear Materials 1993 Vol. 200; Iss. 3

Fast deposition of amorphous carbon and silicon layers

A.J.M. Buuron, G.J. Meeusen, J.J. Beulens, M.C.M. van de Sanden, D.C. Schram
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Volume:
200
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0022-3115(93)90322-p
File:
PDF, 351 KB
english, 1993
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