Influence of low temperature oxidation and nitrogen...

Applied Surface Science 2013 / 10 Vol. 282

Influence of low temperature oxidation and nitrogen passivation on the MOS interface of C-face 4H-SiC

Lee, Kung-Yen, Chang, Yu-Hao, Huang, Yan-Hao, Wu, Shuen-De, Chung, Cheng Yueh, Huang, Chih-Fang, Lee, Tai-Chou
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Volume:
282
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2013.05.080
Date:
October, 2013
File:
PDF, 1.73 MB
english, 2013
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