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Oxidation rate and surface-potential variations of silicon during plasma oxidation
Kitajima, M., Kamioka, I., Nakamura, K. G., Hishita, S.Volume:
53
Language:
english
Journal:
Physical Review B
DOI:
10.1103/PhysRevB.53.3993
Date:
February, 1996
File:
PDF, 184 KB
english, 1996