Comparison endpoint study of process plasma and secondary...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2012 Vol. 30; Iss. 6

Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy

Stephan Thamban, P. L., Yun, Stuart, Padron-Wells, Gabriel, Hosch, Jimmy W., Goeckner, Matthew J.
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Volume:
30
Year:
2012
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4756694
File:
PDF, 1.79 MB
english, 2012
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