Plasma Etching for Sub-45-nm TaN Metal Gates on High-$k$ Dielectrics
Bliznetsov, Vladimir N., Bera, Lakshmi Kanta, Soo, Haw Yun, Balasubramanian, N., Kumar, Rakesh, Lo, Guo-Qiang, Yoo, Won Jong, Tung, Chih Hung, Linn, LinnVolume:
20
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/TSM.2007.895205
Date:
May, 2007
File:
PDF, 1.87 MB
english, 2007