Characteristics of (Ti,Ta)N thin films prepared by using...

Characteristics of (Ti,Ta)N thin films prepared by using pulsed high energy density plasma

Feng, Wenran, Chen, Guangliang, Li, Li, Lv, Guohua, Zhang, Xianhui, Niu, Erwu, Liu, Chizi, Yang, Si-ze
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Volume:
40
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/40/14/018
Date:
July, 2007
File:
PDF, 456 KB
english, 2007
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