Raman Analysis of Microscopic Residual Stresses Stored in the Secondary Phase of Sc2O3-Doped Si3N4
Tochino, Shigemi, Pezzotti, GiuseppeVolume:
287
Year:
2005
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.287.427
File:
PDF, 395 KB
english, 2005