Isotropic wet chemical etching of deep channels with...

Materials Science in Semiconductor Processing 2013 / 12 Vol. 16; Iss. 6

Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions

Bauhuber, Michael, Mikrievskij, Andreas, Lechner, Alfred
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Volume:
16
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2013.05.017
Date:
December, 2013
File:
PDF, 1.02 MB
english, 2013
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