Plasma-parameter dependence of thin-oxide damage from wafer...

Plasma-parameter dependence of thin-oxide damage from wafer charging during electron-cyclotron-resonance plasma processing

Friedmann, J.B., Shohet, J.L., Mau, R., Hershkowitz, N., Bisgaard, S., Shawming Ma,, McVittie, J.P.

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Volume:

Year:

1997

Language:

english

DOI:

10.1109/66.554504

File:

PDF, 574 KB

english, 1997

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