[IEEE 2009 International Workshop on Junction Technology (IWJT) - Kyoto, Japan (2009.06.11-2009.06.12)] 2009 International Workshop on Junction Technology - Electrical transport characterization of nano CMOS devices with ultra-thin silicon film
Ghibaudo, G., Mouis, M., Pham-Nguyen, L., Bennamane, K., Pappas, I., Cros, A., Bidal, G., Fleury, D., Claverie, A., Benassayag, G., Fazzini, P.-F., Fenouillet-Beranger, C., Monfray, S., Boeuf, F., CriYear:
2009
Language:
english
DOI:
10.1109/IWJT.2009.5166220
File:
PDF, 587 KB
english, 2009