SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - ArFi lithogrphy optimization for thin OMOG reticle with fast aerial imaging
Cohen, Yaron, Finders, Jo, Mangan, Shmoolik, Englard, Ilan, Mouraille, Orion, Janssen, Maurice, Miyazaki, Junji, Connolly, Brid, Kojima, Yosuke, Higuchi, Masaru, Starikov, AlexanderVolume:
8324
Year:
2012
Language:
english
DOI:
10.1117/12.918049
File:
PDF, 2.56 MB
english, 2012