Normal regime of the weak-current mode of an rf capacitive discharge
Lisovskiy, V, Yegorenkov, V, Artushenko, E, Booth, J-P, Martins, S, Landry, K, Douai, D, Cassagne, VVolume:
22
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/22/1/015018
Date:
February, 2013
File:
PDF, 1.31 MB
english, 2013