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Suppression of interdiffusion in GaAs/AlGaAs quantum-well structure capped with dielectric films by deposition of gallium oxide
Fu, L., Wong-Leung, J., Deenapanray, P. N. K., Tan, H. H., Jagadish, C., Gong, Bin, Lamb, R. N., Cohen, R. M., Reichert, W., Dao, L. V., Gal, M.Volume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1503857
File:
PDF, 305 KB
english, 2002