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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Conductive layer for charge dissipation during electron-beam exposures
Bozano, Luisa D., Sooriyakumaran, Ratnam, Sundberg, Linda K., Sanchez, Martha I., Lofano, Elizabeth M., Rettner, Charles T., Nagasawa, Takayuki, Watanabe, Satoshi, Kawai, Yoshio, Palavesam, Nagarajan,Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.916756
File:
PDF, 4.40 MB
english, 2012