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Cobalt deposition in porous silicon by chemical vapour infiltration and deposition; the effects of precursor instability
B.J. Aylett, L.G. Earwaker, K. Forcey, T. Giaddui, I.S. HardingVolume:
521
Year:
1996
Language:
english
Pages:
5
DOI:
10.1016/0022-328x(96)06238-9
File:
PDF, 645 KB
english, 1996