![](/img/cover-not-exists.png)
Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
Usui, Takane, Donnelly, Christine A., Logar, Manca, Sinclair, Robert, Schoonman, Joop, Prinz, Fritz B.Volume:
61
Language:
english
Journal:
Acta Materialia
DOI:
10.1016/j.actamat.2013.09.003
Date:
December, 2013
File:
PDF, 2.26 MB
english, 2013