Effects of hydrogen dilution on deposition process of nano-crystalline silicon film by SiCl 4 /H 2 plasma
Wang, Zhaokui, Lou, Yanhui, Lin, Kuixun, Lin, Xuanying, Huang, Rui, Wei, JunhongVolume:
39
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/39/14/023
Date:
July, 2006
File:
PDF, 251 KB
english, 2006