High rate low pressure plasma-enhanced chemical vapor...

Thin Solid Films 2013 / 04 Vol. 532

High rate low pressure plasma-enhanced chemical vapor deposition for barrier and optical coatings

Günther, Steffen, Fahland, Matthias, Fahlteich, John, Meyer, Björn, Straach, Steffen, Schiller, Nicolas
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
532
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2012.11.150
Date:
April, 2013
File:
PDF, 1.51 MB
english, 2013
Conversion to is in progress
Conversion to is failed