Thermal stability of RuO2 thin films prepared by modified atomic layer deposition
Kim, Jin-Hyock, Ahn, Ji-Hoon, Kang, Sang-Won, Roh, Jae-Sung, Kwon, Se-Hun, Kim, Ja-YongVolume:
12
Language:
english
Journal:
Current Applied Physics
DOI:
10.1016/j.cap.2012.02.050
Date:
September, 2012
File:
PDF, 795 KB
english, 2012