Infrared spectroscopy study of low-dielectric-constant...

Journal of Applied Physics 2001 Vol. 90; Iss. 7

Infrared spectroscopy study of low-dielectric-constant fluorine-incorporated and carbon-incorporated silicon oxide films

Kim, Yoon-Hae, Hwang, Moo Sung, Kim, Hyeong Joon, Kim, Jin Yong, Lee, Young
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Volume:
90
Year:
2001
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1402152
File:
PDF, 275 KB
english, 2001
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