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Enhanced Doping Efficiency of Al-Doped ZnO by Atomic Layer Deposition Using Dimethylaluminum Isopropoxide as an Alternative Aluminum Precursor
Wu, Y., Potts, S. E., Hermkens, P. M., Knoops, H. C. M., Roozeboom, F., Kessels, W. M. M.Volume:
25
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm402974j
Date:
November, 2013
File:
PDF, 676 KB
english, 2013