UHV Study of Hydrogen Atom Induced Etching of Amorphous Hydrogenated Silicon Thin Films
Zecho, Thomas, Brandner, Birgit D., Biener, Jürgen, Küppers, JürgenVolume:
105
Language:
english
Journal:
The Journal of Physical Chemistry B
DOI:
10.1021/jp0022611
Date:
May, 2001
File:
PDF, 113 KB
english, 2001