HfO 2 on MoS 2 by Atomic Layer Deposition: Adsorption Mechanisms and Thickness Scalability
McDonnell, Stephen, Brennan, Barry, Azcatl, Angelica, Lu, Ning, Dong, Hong, Buie, Creighton, Kim, Jiyoung, Hinkle, Christopher L., Kim, Moon J., Wallace, Robert M.Volume:
7
Language:
english
Journal:
ACS Nano
DOI:
10.1021/nn404775u
Date:
November, 2013
File:
PDF, 4.42 MB
english, 2013