Self-Assembled Monolayers Exposed by Metastable Helium for...

Self-Assembled Monolayers Exposed by Metastable Helium for Nano-Patterning: Octanethiol and Dodecanethiol

Xin, Ju, Mitsunori, Kurahashi, Taku, Suzuki, Yasushi, Yamauchi
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Volume:
20
Language:
english
Journal:
Chinese Physics Letters
DOI:
10.1088/0256-307X/20/11/047
Date:
November, 2003
File:
PDF, 362 KB
english, 2003
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