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[IEEE 2010 International Workshop on Computational Electronics (IWCE) - Pisa, Italy (2010.10.26-2010.10.29)] 2010 14th International Workshop on Computational Electronics - Random work function variation induced threshold voltage fluctuation in 16-nm bulk FinFET devices with high-k-metal-gate material
Cheng, Hui-Wen, Li, YimingYear:
2010
Language:
english
DOI:
10.1109/IWCE.2010.5677948
File:
PDF, 259 KB
english, 2010